简介:由人类活动产生的氮排放是影响河流氮通量输出的关键,本研究基于人类活动净氮输入模型和流域分布式水文模型(SWAT),计算了山美水库流域2001—2010年人为氮排放强度,模拟估算了同期的河流氮通量,对山美水库河流氮输出与人类活动净氮输入(NANI)之间的响应特征进行研究。结果表明,2001—2010年间,山美水库流域年均人类活动净氮输入强度为11023kgN·km^-2,其中氮肥施用量占NANI总量的60%,是NANI的主要来源;河流氮通量的年际变化特征深受河流年径流变化影响,与NANI并无显著相关;NANI、滞留氮库以及自然背景源对流域河流氮输出总量的贡献率分别达到52%、44%和4%,包括NANI和滞留氮库在内的人为氮输入是影响山美水库流域河流氮通量输出的关键因素。
简介:摘要:氮气有着很高的应用率,结合社会工业发展实际情况及其表现出来的各种生产需求,制氮技术得到了很好的延伸。以此为背景,采用何种技术进行优质且有较广应用范围的氮气的生产,目前已经被氮气生产领域视作实现进一步发展的重要目标之一,本文对深冷制氮与变压吸附制氮两种技术展开研究,分析各自的原理与工艺流程,并对它们作出相应的比较分析。
简介:AIM:Todeterminetheproliferativepotentialandthemaintenanceofstemcellactivityinstoredhumanlimbaltissues,andcorrelatethiswiththepreservationtime,cellviabilityandtheexpressionofstemcellmarkers.METHODS:Thirtylimbalrimsweresplitinto4partsandstoredincornealpreservationmediumat4℃for0,1,4,or7days.ThelimbalstemcellandmitoticmarkersP63,CK19,proliferatingcellnuclearantigen(PCNA),andKi67weredeterminedbyimmunohistochemicalstaining.Theproliferativepotentialoflimbalepithelialcellswasassessedbycellviability,theabilityofgeneratingstratifiedepithelium,andcolonyformingassay.RESULTS:Thestoredtissuesmaintainedlimbalstratifiedstructureto7daysandexhibitedcomparableexpressionlevelofstemcellandmitoticmarkers.Theproportionofviablecellsdecreasedwiththeprolongedpreservationtime,whilecolonyformingefficiencydecreasedfromthe1stdayanddisappearedatthe4thday.Wheninoculatedonamnioticmembrane,thecellspreservedfor1dayformedastratifiedepithelium,whilethecellsfrom4days’preservationformedadiscontinuouslayer.CONCLUSION:Thecolonyformingefficiencyoflimbalepithelialstem/progenitorcellsdecreasedrapidlywiththeincreasingpreservationtime,whiletheexpressionlevelofmarkersandcapacityofformingepithelialmonolayeronamnioticmembranedecreasedgradually.Thelimbalepithelialstemcellslosttheirfunctionearlierthanthelostexpressionlevelofstemcellmarkers.Thismayhelpustobetterchoosetheappropriatepreservationgraftsforfuturelimbalstemcelltransplantation.
简介:CharacteristicsofsiliconoxynitridesmadebyECRplasmas;CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors;CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD;Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy
简介:[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.