简介:PitformationandsurfacemorphologicalevolutioninSi(001)homoepitaxyareinvestigatedbyusingscanningtunnelingmicroscopy.Anti-phaseboundaryisfoundtogiverisetoinitialgenerationofpitsboundbybunchedDBsteps.Theterracesbreakupandarereducedtoacriticalnucleussizewithpitformation.Duetoanisotropickinetics,adownhillbiasdiffusioncurrent,whichislargeralongthedimerrowsthroughthecentreareaoftheterracethanthroughtheareaclosetotheedge,leadstotheprevalenceofpitsboundby{101}facets.Subsequentannealingresultsinashapetransitionfrom{101}-facetedpitstomulti-facetedpits.
简介:水晶的Au5Si2/Si异质接面nanowires(Au5Si2/SiNWs)被热蒸发的SiO粉末在一个低真空系统在厚黄金涂的硅底层上获得。生产Au5Si2/Si异质接面的结构分析被采用一台传播电子显微镜(TEM)和一个选择区域执行电的衍射计。化学作文被纳入TEM的一个精力散的X光分光镜学习。一个二拍子的圆舞生长模型被建议描述Au5Si2/SiNWs的形成。在第一步期间,水晶的SiNWs经由在相对高的温度把帮助氧化物的生长过程与vapour-liquid-solid模型相结合的生长机制被形成。在第二步,preformedSiNWs的温度减少和减少片断与残余Au反应由一个solid-liquid-solid过程形成单个水晶的Au5Si2nanowires。现在的工作应该基于nanowires为未来合成和高质量的金silicidenanowires和微电子设备的研究是有用的。
简介:ForthecomingsuperheavytestexperimentatRIBLL,wedevelopedaSi-arrayderector(showninFig.1)andhavetesteditwitha3-componentαsource.Thisdetectorconsistsofoneposition-sensitiveSi-detector(PSD),fourlarge-areaSiphoto-diodedetectors(SPD)andeightsmall-areaSiphoto-diodedetectors,theirsensitive
简介:Wehavestudiedtheelectronic,bondingandenergeticcharacteristicsoftheFe-Sibinarysystemusingthetight-bondingextendedHuckelmethod.AmongtheFe-Sibinarycompounds,FeSihasthemostsymmetricgeometricarrangementinthecrystalstructure.Italsopossessesthelargestcohesiveenergyperatom.ThiscorrelatestothefactthatFeSiisthemoststablecongruently-meltingcompoundinthebulkphasediagram.Anestimateofinteractionenergiesbetweendifferentatomsisalsogiven.
简介:为研制具有较宽频带微波吸收性能的材料,采用机械合金化法制备CoxFe80-xSi20(x=0,6,10,14摩尔百分数)合金粉体,使用SEM、XRD和矢量网络分析仪等测试手段,研究了合金粉体微观结构及Co-Fe-Si合金微波吸收性能。结果表明:制备的合金粉末呈片状,主要由-Fe相组成;Co的添加使Co-Fe-Si合金出现两个微波吸收峰。在较高频段处的微波吸收峰值随Co的添加先增大后减小。在涂层厚度为1.8mm时,x=10的合金低频处的反射率最小值最小,合金吸波峰频率和峰值分别为6.2GHz和-14.8dB,合金在高频处吸波峰频率和峰值分别为18GHz和-8.8GHz,合金反射率低于-5dB的带宽达14GHz,具有良好的微波吸收宽频效应。
简介:Moleculardynamics(MD)simulationswereperformedtostretchtherectangulargraphenesheetsdopedwithsilicon,nitrogenorboronatoms.Young’smodulus,ultimatestress(strain)andenergyabsorptionweremeasuredforthegraphenesheetswiththedopingconcentration(DC)rangingfrom0to5%.Theemphasiswasplacedonthedistincteffectsofeachindividualdopantonthefundamentalmechanicalpropertiesofgraphene.TheresultsindicatedthatincorporatingthedopantsintographeneledtoanalmostlineardecreaseinYoung’smodulus.Monotonicreductionsinultimatestrength,ultimatestrainandenergyabsorptionwerealsoobserved.Suchdopingeffectswerefoundtobemostsignificantforsilicon,lesspronouncedforboron,andsmallornegligiblefornitrogen.Theoutputsprovideanimportantguidanceforthedevelopmentandoptimizationofnovelnanoscaledevices,andfacilitatethedevelopmentofgraphene-basedM/NEMS.
简介:Anovelread-onlysuper-resolutionopticaldiscstructure(substrate/masklayer/dielectriclayer)ispropsedinthispaper.ByusingaSithinfilmasthemasklayer,therecordingpitswithadiameter380nmandadepth50nmarereadoutonthedynamicmeasuringequipment;thelaserwavelengthλis632.8nmandthenumericalapertureis0.40.IntheoftheSithinfilmis18nmandthesignal-to-noiseratiois32dB.
简介:Binary Reaction Mechanism of 28Si+24Mg at 156.3 MeVBinaryReactionMechanismof28Si+24Mgat156.3MeV¥WangShufang;JinGenm...
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简介:WehavestudiedtheinterfacialstructuresofAlN/Si(111)grownbymetal-organicchemicalvapourdeposition.X-rayphotoelectronspectroscopyandAngerelectronspectroscopywereusedtoanalysethecomponentsandchemicalstructuresofAlN/Si(111).Theresultsindicatedthatamix-crystaltransitionregion,approximately12nm,waspresentbetweentheAlNfilmandtheSisubstrateanditwascomposedofAlNandSi3N4.AfteranalysiswefoundthattheexistenceofSi3N4couldnotbeavoidedintheAlN/Si(111)interfacebecauseofstrongdiffusionat1070℃.EveninAlNlayerSi-Nbonds,Si-Sibondscanbefound.
简介:HeteroepitaxialLaAlO3filmsweregrownonaSrTiO3/Si(100)substratebylasermolecularbeamepitaxyunderdifferentoxygenpressures,andtheirpropertiessuchascrystallinityandelectricalcharacteristicswereexperimentallyinvestigatedusingthevariousmeasurementmethods.Theresultsshowthatmostpropertiesdependmainlyonthedepositionoxygenpressure.ThecrystallinityandtheC-VandI-Vcharacteristicscanbegreatlyimprovedwiththeincreasingoxygendepositionpressure.Moreover,afterannealedat1050~CinN2ambient,theC-VandI-VcharacteristicsofLAOfilmsdepositedattheloweroxygenpressurearealsoimprovedduetothedecreaseofoxygenvacanciesinLAOfilms.
简介:WehavedevelopedaSi/grapheneoxideelectrodesynthesizedviaultrasonication-stirringmethodunderalkalinecondition.Scanningelectronmicroscopy(SEM),transmissionelectronmicroscope(TEM),EDSdot-mappingandhigh-resolutiontransmissionelectronmicroscopy(HRTEM)resultsshowthatSiparticlesareevenlydispersedonthegrapheneoxidesheets.Theelectrochemicalperformancewasinvestigatedbygalvanostaticcharge/dischargetestsatroomtemperature.TheresultsrevealedthatSi/grapheneoxideelectrodeexhibitedahighreversiblecapacityof2825mAh/gwithacoulombicefficiencyof94.6%at100mA/gafter15cyclesandacapacityretentionof70.8%after105cyclesat4000mA/g.Theseperformanceparametersshowagreatpotentialinthehigh-performancebatteriesapplicationforportableelectronics,electricvehiclesandrenewableenergystorage.