简介：摘要目的分析肿瘤沉积(TD)的存在对ypⅢ期直肠癌患者预后的预测作用及其对术后辅助化疗获益的影响。方法回顾分析2007—2017年间福建医科大学附属协和医院接受多学科综合治疗的338例ypⅢ期直肠癌患者资料，将其分为TD(-)组(301例)和TD(＋)组(37例)。Kaplan-Meier法并log-rank检验差异和单因素预后分析，Cox模型多因素分析。结果TD(-)组5年总生存、无远处转移生存、无进展生存均高于TD(＋)组(59.3%∶42.0%，P＝0.001；79.1%∶55.0%，P<0.001；55.6%∶38.0%，P<0.001)，但局部无复发生存相近(96.7%∶85.5%，P＝0.679)。单因素预后分析显示TD(＋)组中TD个数与患者预后无关(P＝0.923)，术后辅助化疗对两组患者预后均无影响(P＝0.103)。多因素预后分析显示TD与更差的总生存相关(HR＝2.343，95%CI为1.257～4.363，P＝0.007)。结论对于接受多学科综合治疗的ypⅢ期直肠癌患者，TD(＋)者的预后更差，TD是总生存的独立预测因子；无论患者是否存在TD，均未能从术后辅助化疗中获益。

简介：AdhesionimprovementofCVDdiamondfilimbyintroducinganelectro-depositedinterlayer;Agitation:themostversatiledegreeoffreedomforsurfacefinishers;Developmentofhydroxyapatitecoatingonporoustitaniumviaelectro-depositiontechnique;EffectofintensemagneticfieldonCdTeelectro-deposition;ElectrodepositionofMetallicLithiumonaTungstenElectrodein1-Butyl-l-methylpyrrolidiniumBis(tritluoromethanesulfone)imideRoom-temperatureMoltenSalt

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简介：[篇名]Bi-2212:AnHTSCoatedConductor,[篇名]Carbonnanotube-perovskite-compositesasnewelectrodematerial,[篇名]CeO{sub}2bufferlayerbypulsedlaserdepositionforYBCOcoatedconductor,[篇名]CeO{sub)2BufferLayersDepositedbyPulsedLaserDepositionforTFA-MODYBa{sub}2Cu{sub}3O{sub)(7-x)SuperconductingTape,[篇名]Characteristicofthin-filmNTCthermalSensors,[篇名]Characteristicsofcobalt-dopedzincoxidethinfilmspreparedbypulsedlaserdeposition,[篇名]CharacteristicsofTiO{sub}2ThinFilmasaPhotocatalystPrepardUsing-thePulsedLaserDepositionMethod.

简介：Co-dopingDepositionofp-typeZnOThinFilmsusingKrFExcimerLaserAblation;ComparisonofGrowthMorphologyinGe(001)HomoepitaxyUsingPulsedLaserDepositionandMBE;CompositionandstructureofBCNfilmspreparedbyionbeam-assistedpulsedlaserdeposition;Compositionofβ-FeSi{sub}2thin-filmsgrownbyapulsedlaserdepositionmethod

简介：SY509-3-202[篇名]Influenceofthetemperaturedistributiononchemicaldepositionininternalproblems；SY509-3-203[篇名]ManufacturingReliableUnlaededViasWithoutCVDBarrierLayers；……

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简介：[篇名]Electro-depositionoftantalumontumgstenandnickelinLiF-NaF-CaF{sub}2meltcontainingK{sub}2TaF{sub}7electrochemicalstudy,[篇名]Electro-EpitaxialBufferLaycrsforREBCOTspeArchitectures,[篇名]EQCMwithair-gapexcitationelectrode.Calibrationtestswithcopperandoxygencoatings,[篇名]FormationofWell-definedNanocolumnsbyIonTrackingLithography,[篇名]Fundamentalexperimentalstudyonfreefabricationofnanocrystallinecopperbulkbyselectiveelectrodepositionwithelectrolytejet,[篇名]Magneticnanowirearraysobtainedbyelectro-depositioninorderedaluminatemplates,[篇名]Morphologicalcharacteristicsofnickelparticleselectrodepositedfromchloridedominantsolution.

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简介：1799年,意大利物理学家亚历山德罗·伏打将铜和锌用盐水纸片间隔着堆叠到一起,得到了世界上第一个原电池。他不仅把当时的电学研究从静电扩展到电流,还开启了电化学研究的大门。电的参与给化学带来了无限的可能性:隐藏在化学反应中的电能被提取出来时我们得到了电池,而对特定的化学体系施加电压,则能让化学反应向着我们希望的方向进行。

简介：SY509-3-209[篇名]CrystallinePropertiesofFerroelectric-RelaxorPMN-PIThinFilmsbyPulsedLaserDeposition；SY509-3-210[篇名]CuprateBasedOxideSuperlatticesShowingSimultaneouslySuperconductingandFerromagneticProperties；……

简介：异重流是一种与河口连接、密度大于周围水体，并沿着水底流动的液体，一般产生在干燥、炎热、少植被地区的洪水期，是一种持续性的浊流。由异重流形成的沉积岩称为异重岩，层面富含丰富的有机质和陆地植物碎屑，异重流沉积叠加厚度可达数十米，它的平面特征表现为舌状体、水道和堤岸沉积单元的物源富砂和富泥型特征。异重流的这种特性，在水库减少淤，或者修建蓄水电站的时候，在底部设置底孔，能够通过利用库底的浑水异重流将泥沙排走，所以通长用在水库减少淤工作中。

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简介：AComputationalStudyofGasPhaseChemistryinCarbonNanotubeSynthessbyPECVD;AfieldpointbasedapproachforsensorconditioninginMO-CVDreactors;AMethodforReal-TimeControlofThinFilmCompositionUsingOESandXPS;Amechanism-basedmodelofchemicalvapordepositionofepitaxialSi{sub}(1-x)Ge{sub}xflirts

简介：SY509-3-196[篇名]Anovelstrainedsurface-channelpMOSFETSi{sub}0.7Ge{sub}0.3withanALDTiN/AI{sub}20{sub}3/HfAIO{sub}x/AI{sub}20{sub}3gatestack；SY509-3-197[篇名]Aquantitativestudyofthenano-scratchbehaviorofboronandcarbonnitridefilms；……

简介：[篇名]1.55-umsilicon-basedreflection-typewaveguide-integratedthermo-opticswitch,[篇名]120×90ElementThermoelectricInfraredFocalPlaneArraywithPreciselyPatternedAu-blackAbsorber,[篇名]4H-SiCEpitaxialGrowthfcrHigh-PowerDevices,[篇名]A90nmgenerationcopperdualdamascenetechnologywithALDTaNbarrier,[篇名]Acomparativemicrotribologicalinvestigationofdiamond-likecarbonfilmsforapplicationsinmicrosystems,[篇名]Acomparisonofmicrocrystailinesiliconpreparedbyplasma-enhancedchemicalvapordepositionandhot-wirechemicalvapordeposition:electronicanddeviceproperties.