简介:Anewtwo-dimensionalstructuremodulationalongc-andb-axeshasbeendiscoveredinsuperconductingsinglecrystalsofBi2.13Sr1.87CuO6+δ(Bi2201)byx-rayscattering.Suchmodulationstructuredoesnotexistinnon-superconductingBi2201singlecrystals.Butinsteadlatticedistortionsareobservedinthea-b-plane.Thisphenomenonmayindicatethatbothstrainrelaxationandchargemodulationinthea-b-planeareimportanttotheoccurrenceofsuperconductivityinthecopperoxides.
简介:压力管卧式重水反应堆(CANDU6)具有相互独立的冷却剂系统和慢化剂系统。慢化剂系统将堆芯高能裂变中子慢化到能维持持续裂变所需的热中子水平,并将慢化中子过程中产生的热量带出。在反应堆大修期间,需要对再循环冷却水系统(RCW)进行检修,则需要并投入其备用系统,但是RCW备用系统仅对反应堆冷却剂系统进行冷却,不提供慢化剂系统热交换器冷却水。所以在RCW备用系统投入的情况下,慢化剂系统丧失冷却。为判断在此情况下慢化剂的温度变化情况,本文对CANDU6大修期间慢化剂系统丧失冷却情况下的温度变化进行分析并与试验结果进行比较,评估是否会由于温度过高而导致系统失效。
简介:Thisworkinvestigatesinternalplasmaprocessparametersusingahairpinresonanceprobeandopticalemissionspectroscopy.ThedependenceofelectrondensityandatomicfluorineonthepercentageofoxygeninanSF6/O2dischargewasmeasuredusingthesemethods.AnRIEOxfordInstruments80pluschamberwasusedfortheexperiments.Twodifferentprocesspowers(100Wand300W)ataconstantpressure(100mTorr)wereused,anditwasfoundthattheopticalemissionintensityofthe703.7nmand685.6nmlinesofatomicfluorineincreasedrapidlyasoxygenwasaddedtotheSF6discharge,reachedtheirmaximumatanO2fractionof20%andthendecreasedwithfurtheradditionofoxygen.TheplasmaelectrondensitywasalsostronglyinfluencedbytheadditionofO2.
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简介:ThisworkinvestigatedC2F6/O2/ArplasmachemistryanditseffectontheetchingcharacteristicsofSiCOHlow-kdielectricsin60MHz/2MHzdual-frequencycapacitivelycoupleddischarge.FortheC2F6/Arplasma,theincreaseinthelow-frequency(LF)powerledtoanincreasedionimpact,promptingthedissociationofC2F6withhigherreactionenergy.Asaresult,fluorocarbonradicalswithahighF/Cratiodecreased.Theincreaseinthedischargepressureledtoadecreaseintheelectrontemperature,resultinginthedecreaseofC2F6dissociation.FortheC2F6/O2/Arplasma,theincreaseintheLFpowerpromptedthereactionbetweenO2andC2F6,resultingintheeliminationofCF3andCF2radicals,andtheproductionofanF-richplasmaenvironment.TheF-richplasmaimprovedtheetchingcharacteristicsofSiCOHlow-kfilms,leadingtoahighetchingrateandasmoothetchedsurface.