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  • 简介:Thefullpotentiallinearizedaugmentedplanewave(FLAPW)methodisusedtostudythecrystalstructureandelectronicstructurepropertiesofPbFeo.5Nbo.5O3(PFN).Theoptimizedcrystalstructure,densityofstates,bandstructureandelectrondensitydistributionhavebeenobtainedtounderstandtheferroelectricbehaviourofPFN.TheanalysisresultofthedensityofstatesshowsthereisanobviouschangeofNbdstatesintheparaelectric-to-ferroelectricphasetransition.ThepolarizationresultshowsthatthecontributiontoferroelectricityofNbatomsislargerthanthatofFeatoms.InferroelectricphasethereisahybridizationofFed-OpandNbd-OpinferroelectricPFN.Thisisconsistentwiththeresultoftheelectronicbandstructure.Thishybridizationisresponsibleforthetendencytoitsferroelectricity.

  • 标签: 电子结构 PbFe0.5Nb0.5O3 钙钛矿 FLAPW法 晶体结构
  • 简介:<正>Foranoddfunctionf(x)definedonlyonafiniteinterval,thispaperdealswiththeexistenceofperiodicsolutionsandthenumberofsimpleperiodicsolutionsofthedifferentialdelayequation(DDE)(?)(t)=-f(x(t-1)).Byuseofthemethodofqualitativeanalysiscombinedwiththeconstructingofspecialsolutionsaseriesofinterestingresultsareobtainedontheseproblems.

  • 标签: ODD function PERIODIC solution DIFFERENTIAL DELAY
  • 简介:Theoneplusone(1+1)modeofhydrosilationreactionofladderlikecis-isotaticpolyallylsilsesquioxane(AllyI-T)andpolyhydrosilsesquioxane(H-T)usingdicyclopentadienylplatinumdichloride(Cp2PtCl2)asthecatalystleadstotheformationofanewpolyorganosiloxane(POS).ThepresenceofnanoscaletubularstructureintheproductPOSwaspreliminarilyprovedbyIR,1H-NMR,differentialscanningcalorimetry(DSC),X-raydiffraction(XRD),gelpermeationchromatography(GPC),atomicforcemicroscopy(AFM)andmolecularsimulation.

  • 标签: Hydrosilylation Polyorganosiloxane Self-assembly TUBULAR structure
  • 简介:本文从分析双T网络虚地输出端着手,借助串/并联等效变换,给出双T网络的电压/电流相量图和阻抗图;引入对称化处理概念;界定了双T网络的实际输入阻抗;建立了完备的阻抗方程组,并做了按指定输入阻抗设计电路的示范。

  • 标签: 虚地 电压/电流相量图 阻抗分界线 实际输入阻抗
  • 简介:Threefold Fragmentation of Hot Compound Nuclei in 25 MeV/u40Ar+115In, 103Rh and 93Nb ReactionsThreefoldFragmentatio...

  • 标签: 40Ar FRAGMENT
  • 简介:Theglassytransitionofthepolyethyleneterephthalate(PET)sampleswhichhavebeensubjectedtosolventinducedcrystallization(SINC)wasinvestigatedbymodulateddifferentialscanningcalorimetry(MDSC)anddensitymeasurement.Thedif-ferentialofheatcapacitysignal,dC_p/dTfromMDSC,wasusedtomonitortheSINCprocess.ItrevealsthattheT_gtemperatureshiftstohighervaluewiththeadvancementofSINC.Whenthetoluene-immersingtimewaslonger(168h),thedetectionofT_gbecomemoredifficult,becausesomesmallerpeaksemergedatthelowertemperaturesandtheseareexplainedasthemovementofsmallsegmentsintheamorphousregion.TheseobservedresultsareduetothemorphologyandstructureintroducedbytheSINCprocess.

  • 标签: MODULATED DSC POLYETHYLENE TEREPHTHALATE SINC
  • 简介:Theone-dimensionalsuper-symmetricferromagnetict-JmodelisstudiedviathethermalBetheansatz.AnalyticexpressionsofthefreeenergyforT→Oareobtained.AnewcriticalbehaviourbeyondtheuniversalclassofLuttingerLiquidsisfoundinthissystem.

  • 标签: 铁磁t-J模型 临界行为 低温物理
  • 简介:探讨用等离子体喷涂方法制备降低较高强度材料与U-Nb合金之间的摩擦性能的减磨层的可行性以及这些减磨层的摩擦特性。选用Sn为软涂层,ZrO2为硬涂层。采用SulzerMETCO9M等离子体喷涂机制备了Sn单层、ZrO2单层、Sn/ZrO2双层、Sn+ZrO2混合层等4种涂层。利用CSEM型销盘型摩擦磨损试验机分析了半径为3mm的U-Nb合金对偶销在涂层上滑动时的干摩擦特性,滑动速度分别为0.42,6.4,26.16cm/s。涂层为典型的等离子体喷涂涂层形貌。表面为Sn的涂层颗粒熔合状况和致密性比ZrO2单层好,其粗糙度低,Sn+ZrO2混合涂层表面形貌与ZrO2单层相近。Sn和ZrO2分别以bcc结构的Sn和四方结构ZrO2结构存在。

  • 标签: 等离子体喷涂 铀-铌合金 摩擦性能 二氧化锆
  • 简介:Thetheta(t)-typeoscillatorysingularintegraloperatorshasbeendiscussed.Withthenon-negativelocallyintegrableweightedfunction,theweightednorminequalityoftheta(t)-typeoscillatorysingularintegraloperatorsisproved,andtheweightedfunctionhasreplacedbyactionofHardy-Littlewoodmaximaloperatorsseveraltimes.

  • 标签: theta(t) -type OSCILLATORY singular integral weighted
  • 简介:本文利用等价方程组,友矩阵与Jordan标准型,研究了n阶常系数线性非齐次常微分方程P(D)x=acose^t+bsine^t其中P(D)=D^n+a1D^n-1+…+an,D=1/dt,a1,a2,…a,a,b为任意实常数,在友矩阵具有n个不同的特征根的条件下,给出了求上述方程的特解的方法,最后给出一个详细的实例。

  • 标签: 常系数线性非齐次常微分方程 特解 友矩阵 JORDAN标准形
  • 简介:ThegrowinginterestintheuseofGalliumArsenidssemiconductormaterialshaspresentedmanyopportunitiesfordeviceoperationalspeedimprovementsbuthasalsopresentedmanyproblemsforthedevicemaker,Anoveldeep-submicronx-raylithographyprocessforT-shapedgatepatternsusefulforhigh-electron-mobilitytransistors(HEMT)isintroducedinthiswork.InthefabricationofT-shapedgateatherrlayerresistsmethodisused.Thex-rayexposureexperimentswerefinishedbyBeijingSynchrotronRadiationFacility(BSRF)3B1Abeamline,andgoodresulthasbeenobtained.

  • 标签: X射线平板印刷术 半导体二极管器件 T-型门图样
  • 简介:PREPARATIONOFN--BUTYLOXYCARBONYL-O ̄α-9-FLUORENYLMETHYLESTEROFASPARTICACID¥ZongJinHAN;ZhenKaiDINGandQiKaiZHANG(BeijingInstitu...

  • 标签: ACID PREP