简介:AnomalousLeakageCurrentinSilicon0xynitrideThinFilmsGrownbyMicrowaveExcitedNitrogenPlasmaNitridation.Applicationoftheexplosivemethodforcreatingnitrogenlayers;Brightplasmanitridingofferriticsteelwithseveralalloyingelements;Cleaningasthemostimportantsteptowardssuccessfulheattreatment
简介:[篇名]ActivatedMigrationSintering,[篇名]Activationofsteelsurfacesbyoxynitriding,[篇名]Activescreenplasmanitridingtechnology,[篇名]AdvancedPlasmaNitridingforAluminumandAluminumAlloys,[篇名]Ananti-corrosionandwear-resistingcompoundingnitridedlayeronprecisepressedpartsofsoftsteels,[篇名]Anexperimentalstudytocorrelatewaterjetimpingementerosionresistanceandpropertiesofmetallicmaterialsandcoatings,[篇名]AnInfluenceofSonBombardingontheEffectsofNitridinginD.C.GlowDischargePlasma。
简介:CharacteristicsofsiliconoxynitridesmadebyECRplasmas;CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors;CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD;Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy
简介:[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.
简介:[篇名]Astudyonfrictionandwearbehaviourofcarburized,carbonitridedandboridedAISI1020and5115steels,[篇名]AlloyCarburizationatTemperaturesof1,200-2,100F(650-1,150℃),[篇名]Amorphoussiliconcarbonitridefibersdrawnfromalkoxidemodifiedceraser,[篇名]Bearingswithincrcasedreliability,[篇名]Brightoutlookforhardcoatings,[篇名]Carbonitridccoatingbylow-temperaturediffusionprocess,[篇名]Carbonitridcnanomaterials,thinfilms,andsolids.