TheultrafastdynamicprocessinsemiconductorGeirradiatedbythefemtosecondlaserpulsesisnumericallysimulatedonthebasisofvanDrielsystem.Itisfoundthatwiththeincreaseofdepth,thecarrierdensityandlatticetemperaturedecrease,whilethecarriertemperaturefirstincreasesandthendrops.ThelaserfluencehasagreatinfluenceontheultrafastdynamicalprocessinGe.Asthelaserfluenceremainsaconstantvalue,thoughtheoverallevolutionofthecarrierdensityandlatticetemperatureisalmostindependentofpulsedurationandlaserintensity,increasingthelaserintensitywillbemoreeffectivethanincreasingthepulsedurationinthegenerationofcarriers.IrradiatingtheGesamplebythefemtoseconddoublepulses,theultrafastdynamicalprocessofsemiconductorcanbeaffectedbythetemporalintervalbetweenthedoublepulses.