简介:WehavestudiedtheinterfacialstructuresofAlN/Si(111)grownbymetal-organicchemicalvapourdeposition.X-rayphotoelectronspectroscopyandAngerelectronspectroscopywereusedtoanalysethecomponentsandchemicalstructuresofAlN/Si(111).Theresultsindicatedthatamix-crystaltransitionregion,approximately12nm,waspresentbetweentheAlNfilmandtheSisubstrateanditwascomposedofAlNandSi3N4.AfteranalysiswefoundthattheexistenceofSi3N4couldnotbeavoidedintheAlN/Si(111)interfacebecauseofstrongdiffusionat1070℃.EveninAlNlayerSi-Nbonds,Si-Sibondscanbefound.
简介:TostudytheadsorptionbehaviorofCu+inaqueoussolutiononsemiconductorsurface,theinteractionsofCu+andhydratedCu+cationswiththecleanSi(111)surfacewereinvestigatedviahybriddensityfunctionaltheory(B3LYP)andMller-Plessetsecond-orderperturbation(MP2)method.ThecleanSi(111)surfacewasdescribedwithclustermodels(Si14H17,Si16H20andSi22H21)andafour-siliconlayerslabunderperiodicboundaryconditions.CalculationresultsindicatethatthebondingnatureofadsorptionofCu+onSisurfacecanbeviewedaspartialcova-lentaswellasionicbonding.ThebindingenergiesbetweenhydratedCu+cationsandSi(111)surfacearelarge,suggestingastronginteractionbetweenthem.ThecoordinationnumberofCu+(H2O)nonSi(111)surfacewasfoundtobe4.Asthenumberofwatermoleculesislargerthan5,watermoleculesformahydrogenbondnetwork.Inaqueoussolution,Cu+cationswillsafelyattachtothecleanSi(111)surface.
简介:Intrinsiccarrierconcentration(ni)isoneofthemostimportantphysicalparametersforunderstandingthephysicsofstrainedSiandSi1-xGexmaterialsaswellasforevaluatingtheelectricalpropertiesofSi-basedstraineddevices.Uptonow,thereportonquantitativeresultsofintrinsiccarrierconcentrationinstrainedSiandSi1-xGexmaterialshasbeenstilllacking.Inthispaper,byanalyzingthebandstructureofstrainedSiandSi1-xGexmaterials,boththeeffectivedensitiesofthestatenearthetopofvalencebandandthebottomofconductionband(NcandNv)at218,330and393KandtheintrinsiccarrierconcentrationrelatedtoGefraction(x)at300KweresystematicallystudiedwithintheframeworkofKPtheoryandsemiconductorphysics.ItisfoundthattheintrinsiccarrierconcentrationinstrainedSi(001)andSi1-xGex(001)and(101)materialsat300KincreasessignificantlywithincreasingGefraction(x),whichprovidesvaluablereferencestounderstandtheSibasedstraineddevicephysicsanddesign.
简介:WepresentthetemperaturedependentelectricaltransportmeasurementsofAg/Si(111)-(√3×√3)R30°bytheinsitumicro-four-pointprobemethodintegratedwithscanningtunnelingmicroscopy.Thesurfacestructurecharacterizationsshowhexagonalpatternsatroomtemperature,whichsupportstheinequivalenttriangle(IET)model.Ametal-insulatortransitionoccursat-115K.Thelowtemperaturetransportmeasurementsclearlyrevealthestronglocalizationcharacteristicsoftheinsulatingphase.
简介:AmassofGaNnanowireshasbeensuccessfullysynthesizedonSi(111)substratesbymagnetronsputteringthroughammoniatingGa2O3/Cofilmsat950C.X-raydiffraction,scanningelectronmicroscopy,highresolutiontransmissionelectronmicroscopeandFouriertransformedinfraredspectraareusedtocharacterizethesamples.Theresultsdemonstratethatthenanowiresareofsingle-crystalGaNwithahexagonalwurtzitestructureandpossessrelativelysmoothsurfaces.ThegrowthmechanismofGaNnanowiresisalsodiscussed.更多还原
简介:采用超高真空气相沉积系统外延硒(Se)超薄层钝化Si(100)表面,研究其与金属铝(A1)、铂(Pt)的接触特性。对于A1与Se钝化后的Si接触样品,其肖特基势垒高度(SBH)值为0.2eV,相比于HF处理的样品,SBH降低了一半;随着退火温度从200P升至500P,SBH值逐渐升高至HF处理的样品的SBH值。而对Pt与Se钝化的Si接触样品,未退火时电流电压特性基本与HF处理的样品一致,然而快速热退火后,Se钝化的样品基本保持不变,而HF处理的样品反向偏置电流迅速增大。通过拟合金半接触SBH与金属功函数的关系,得到线性关系的斜率为:=0.41,说明硒超薄层可以降低Si(100)表面与金属接触费米钉扎效应。
简介:摘要 某钢厂生产的小规格(Ф13-Ф14mm)60Si2Mn弹簧钢表面存在翘皮、划伤等缺陷,合格率仅85%,严重制约交货时间,增加生产成本。经过分析,弹簧钢表面缺陷的产生原因主要是钢坯角部扒皮质量不好和活套、裙板辊、裙板罩板等工装件使用维护不到位。通过提升钢坯扒皮质量和工装件使用、维护标准,可以减少钢材表面缺陷的产生,提高合格率到90%以上。
简介:<正>“Privacy”istranslatedasyinsiinChinese.Traditionally,intheChinesemind,yinsiisassociatedwithsomethingthatisclosedorunfair.Ifsomeoneissaidtohaveyinsi,meddlers(好事者)willbeattractedtopry(打探)intohisorheraffairs.Sopeoplealwaysstatethattheydon’thaveyinsi.
简介:TheinvestigationonopticalpropertiesofSi1-xGex/Sistrainedlayerstructureshasbeencarriedoutactivelyinrecentyears.Thephotoluminescencehasbe-comeabriskersubjectinthestudiesofitsvariousopticalproperties.Aresearchdevelop-menttophotoluminescencepropertiesofsomenewSi1-xGex/Sistrainedlayerstruc-turesisintroduced.