简介:TomoreindepthunderstandthedopingeffectsofoxygenonSiGealloys,boththemicro-structureandpropertiesofO-dopedSiGe(including:bulk,(001)surface,and(110)surface)arecalculatedbyDFT+Umethodinthepresentwork.Thecalculatedresultsareasfollows.(i)The(110)surfaceisthemainexposingsurfaceofSiGe,inwhichOimpuritypreferstooccupythesurfacevacancysites.(ii)ForOinterstitialdopingonSiGe(110)surface,theexistencesofenergystatescausedbyOdopinginthebandgapnotonlyenhancetheinfraredlightabsorption,butalsoimprovethebehaviorsofphoto-generatedcarriers.(iii)ThefindingaboutdecreasedsurfaceworkfunctionofO-dopedSiGe(110)surfacecanconfirmpreviousexperimentalobservations.(iv)Inallcases,Odoingmainlyinducestheelectronicstructuresnearthebandgaptovary,butisnotdirectlyinvolvedinthesevariations.Therefore,thesefindingsinthepresentworknotonlycanprovidefurtherexplanationandanalysisforthecorrespondingunderlyingmechanismforsomeoftheexperimentalfindingsreportedintheliterature,butalsoconducetothedevelopmentofμc-SiGe-basedsolarcellsinthefuture.
简介:Higher-κdielectricLaLuO_3,depositedbymolecularbeamdeposition,withTiNasgatestackisintegratedintohigh-mobilitySi/SiGe/SOIquantum-wellp-typemetal-oxide-semiconductorfieldeffecttransistors.Thresholdvoltageshiftandcapacitanceequivalentthicknessshrinkareobserved,resultingfromoxygenscavengingeffectinLaLuO_3withTi-richTiNafterhightemperatureannealing.Themechanismofoxygenscavenginganditspotentialforresistivememoryapplicationsareanalyzedanddiscussed.