简介:在沉积盆地中,断层可以充当流体流动的阻挡层,也可以充当流体通道。但断层的性质取决于断层带变形及随后成岩过程中的应力条件和岩石性质。近期的一些出版物认为,受第四纪冰川加载所产生的应力的影响,挪威中部海域北海和哈尔腾浅滩地区的油藏沿断层发生了渗漏。而这些地区的侏罗系油藏被晚侏罗世断层作用形成的断层围限,发生断层作用时这里的沉积地层仍然是松软且大部分未胶结。这些断层带并不代表着脆弱带。受砂岩应变硬化和后期成岩作用以及泥岩胶结作用的影响,断层带通常比周围的岩石更坚硬。因此,这些断层带不可能因构造运动而活化。此外,这些油田的上覆第四纪沉积地层中极少有冰川变形的证据。有人提出,非常大的水平应力(据推测与冰川加载期有关)在低于破裂压力的孔隙压力条件下引起剪切破裂,并导致油气随后沿着这些剪切带发生渗漏。我们认为,这种机理在沉积盆地渐进埋藏期间是不可靠的。哈尔腾浅滩约3km深处的水平有效应力高达60MPa,这样高的应力所产生的机械压实和颗粒破碎程度,应当高于地下的观测结果。外应力[即洋脊扩展(洋脊推进)所产生的板块构造应力]将主要通过基底而不是可压缩性更强的上覆沉积岩传递。在盆地逐渐沉降期间,石英胶结所引起的化学压实作用会导致岩石收缩,从而使应力差减小。这种情况会导致脆性变形(剪切破裂),因此在低于破裂压力的应力条件下不可能出现开启裂缝。在逐渐压实的沉降沉积盆地中,在正常情况下水平应力不会超过垂向应力,但下伏基底明显缩短的情况除外。
简介:AdhesionimprovementofCVDdiamondfilimbyintroducinganelectro-depositedinterlayer;Agitation:themostversatiledegreeoffreedomforsurfacefinishers;Developmentofhydroxyapatitecoatingonporoustitaniumviaelectro-depositiontechnique;EffectofintensemagneticfieldonCdTeelectro-deposition;ElectrodepositionofMetallicLithiumonaTungstenElectrodein1-Butyl-l-methylpyrrolidiniumBis(tritluoromethanesulfone)imideRoom-temperatureMoltenSalt
简介:[篇名]Bi-2212:AnHTSCoatedConductor,[篇名]Carbonnanotube-perovskite-compositesasnewelectrodematerial,[篇名]CeO{sub}2bufferlayerbypulsedlaserdepositionforYBCOcoatedconductor,[篇名]CeO{sub)2BufferLayersDepositedbyPulsedLaserDepositionforTFA-MODYBa{sub}2Cu{sub}3O{sub)(7-x)SuperconductingTape,[篇名]Characteristicofthin-filmNTCthermalSensors,[篇名]Characteristicsofcobalt-dopedzincoxidethinfilmspreparedbypulsedlaserdeposition,[篇名]CharacteristicsofTiO{sub}2ThinFilmasaPhotocatalystPrepardUsing-thePulsedLaserDepositionMethod.
简介:Co-dopingDepositionofp-typeZnOThinFilmsusingKrFExcimerLaserAblation;ComparisonofGrowthMorphologyinGe(001)HomoepitaxyUsingPulsedLaserDepositionandMBE;CompositionandstructureofBCNfilmspreparedbyionbeam-assistedpulsedlaserdeposition;Compositionofβ-FeSi{sub}2thin-filmsgrownbyapulsedlaserdepositionmethod
简介:[篇名]Electro-depositionoftantalumontumgstenandnickelinLiF-NaF-CaF{sub}2meltcontainingK{sub}2TaF{sub}7electrochemicalstudy,[篇名]Electro-EpitaxialBufferLaycrsforREBCOTspeArchitectures,[篇名]EQCMwithair-gapexcitationelectrode.Calibrationtestswithcopperandoxygencoatings,[篇名]FormationofWell-definedNanocolumnsbyIonTrackingLithography,[篇名]Fundamentalexperimentalstudyonfreefabricationofnanocrystallinecopperbulkbyselectiveelectrodepositionwithelectrolytejet,[篇名]Magneticnanowirearraysobtainedbyelectro-depositioninorderedaluminatemplates,[篇名]Morphologicalcharacteristicsofnickelparticleselectrodepositedfromchloridedominantsolution.
简介:AComputationalStudyofGasPhaseChemistryinCarbonNanotubeSynthessbyPECVD;AfieldpointbasedapproachforsensorconditioninginMO-CVDreactors;AMethodforReal-TimeControlofThinFilmCompositionUsingOESandXPS;Amechanism-basedmodelofchemicalvapordepositionofepitaxialSi{sub}(1-x)Ge{sub}xflirts