简介：Intrinsiccarrierconcentration（ni）isoneofthemostimportantphysicalparametersforunderstandingthephysicsofstrainedSiandSi1-xGexmaterialsaswellasforevaluatingtheelectricalpropertiesofSi-basedstraineddevices.Uptonow,thereportonquantitativeresultsofintrinsiccarrierconcentrationinstrainedSiandSi1-xGexmaterialshasbeenstilllacking.Inthispaper,byanalyzingthebandstructureofstrainedSiandSi1-xGexmaterials,boththeeffectivedensitiesofthestatenearthetopofvalencebandandthebottomofconductionband（NcandNv）at218,330and393KandtheintrinsiccarrierconcentrationrelatedtoGefraction（x）at300KweresystematicallystudiedwithintheframeworkofKPtheoryandsemiconductorphysics.ItisfoundthattheintrinsiccarrierconcentrationinstrainedSi（001）andSi1-xGex（001）and（101）materialsat300KincreasessignificantlywithincreasingGefraction（x）,whichprovidesvaluablereferencestounderstandtheSibasedstraineddevicephysicsanddesign.