摘要
Inthispaper,thethree-dimensional(3D)couplingeffectisdiscussedfornanowirejunctionlesssilicon-on-insulator(SOI)FinFETs.Withfinwidthdecreasingfrom100nmto7nm,theelectricfieldinducedbythelateralgatesincreasesandthereforetheinfluenceofbackgateonthethresholdvoltageweakens.Foranarrowandtallfin,thelateralgatesmainlycontrolthechannelandthereforetheeffectofbackgatedecreases.Asimpletwo-dimensional(2D)potentialmodelisproposedforthesubthresholdregionofjunctionlessSOIFinFET.TCADsimulationsvalidateourmodel.Itcanbeusedtoextractthethresholdvoltageanddopingconcentration.Inaddition,thetuningofbackgateonthethresholdvoltagecanbepredicted.
出版日期
2016年04月14日(中国期刊网平台首次上网日期,不代表论文的发表时间)